Non-isoplanatic lens aberration corrections in digital holographic microscopy

Tamar Cromwijk; Manashee Adhikary; Sander Konijnenberg; Wim Coene; Teus Tukker; Johannes de Boer; Stefan Witte; Arie den Boef

doi:https://doi.org/10.1117/12.2673637

Non-isoplanatic lens aberration corrections in digital holographic microscopy

Tamar Cromwijk, Manashee Adhikary, Sander Konijnenberg, Wim Coene, Teus Tukker, Johannes de Boer, Stefan Witte, Arie den Boef

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

The demand for accurate and sub-nanometer precise overlay measurements in semiconductor industry increases with the shrinking feature sizes in integrated circuits. Overlay, the lateral displacement between two layers allows monitoring the chip fabrication process and is part of an import feedback step. In our approach, a digital holographic microscope measures the complex field of the overlay target using simple optics and an additional reference beam. The measured complex valued field allows us to apply computational algorithms to correct for field-position dependent lens aberrations in a computational efficient manner. We present experimental results that show the capability of our computational aberration correction in the visible and near infrared wavelength regimes.

Original language	English
Title of host publication	Optical Measurement Systems for Industrial Inspection XIII
Editors	Peter Lehmann
Publisher	SPIE
Volume	12618
ISBN (Electronic)	9781510664456
DOIs	https://doi.org/10.1117/12.2673637
Publication status	Published - 2023
Event	Optical Measurement Systems for Industrial Inspection XIII 2023 - Munich, Germany Duration: 26 Jun 2023 → 29 Jun 2023

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	12618

Conference

Conference	Optical Measurement Systems for Industrial Inspection XIII 2023
Country/Territory	Germany
City	Munich
Period	26/06/2023 → 29/06/2023

Keywords

Semiconductor metrology
computational imaging
digital holographic microscopy
lens aberrations correction

Access to Document

https://doi.org/10.1117/12.2673637

Cite this

Cromwijk, T., Adhikary, M., Konijnenberg, S., Coene, W., Tukker, T., de Boer, J., Witte, S., & den Boef, A. (2023). Non-isoplanatic lens aberration corrections in digital holographic microscopy. In P. Lehmann (Ed.), Optical Measurement Systems for Industrial Inspection XIII (Vol. 12618). Article 126180Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12618). SPIE. https://doi.org/10.1117/12.2673637

@inproceedings{80d500b0f3b2413391d8735679ec256a,

title = "Non-isoplanatic lens aberration corrections in digital holographic microscopy",

abstract = "The demand for accurate and sub-nanometer precise overlay measurements in semiconductor industry increases with the shrinking feature sizes in integrated circuits. Overlay, the lateral displacement between two layers allows monitoring the chip fabrication process and is part of an import feedback step. In our approach, a digital holographic microscope measures the complex field of the overlay target using simple optics and an additional reference beam. The measured complex valued field allows us to apply computational algorithms to correct for field-position dependent lens aberrations in a computational efficient manner. We present experimental results that show the capability of our computational aberration correction in the visible and near infrared wavelength regimes.",

keywords = "Semiconductor metrology, computational imaging, digital holographic microscopy, lens aberrations correction",

author = "Tamar Cromwijk and Manashee Adhikary and Sander Konijnenberg and Wim Coene and Teus Tukker and {de Boer}, Johannes and Stefan Witte and {den Boef}, Arie",

note = "Publisher Copyright: {\textcopyright} 2023 SPIE.; Optical Measurement Systems for Industrial Inspection XIII 2023 ; Conference date: 26-06-2023 Through 29-06-2023",

year = "2023",

doi = "https://doi.org/10.1117/12.2673637",

language = "English",

volume = "12618",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Peter Lehmann",

booktitle = "Optical Measurement Systems for Industrial Inspection XIII",

address = "United States",

}

Cromwijk, T, Adhikary, M, Konijnenberg, S, Coene, W, Tukker, T, de Boer, J, Witte, S & den Boef, A 2023, Non-isoplanatic lens aberration corrections in digital holographic microscopy. in P Lehmann (ed.), Optical Measurement Systems for Industrial Inspection XIII. vol. 12618, 126180Y, Proceedings of SPIE - The International Society for Optical Engineering, vol. 12618, SPIE, Optical Measurement Systems for Industrial Inspection XIII 2023, Munich, Germany, 26/06/2023. https://doi.org/10.1117/12.2673637

Non-isoplanatic lens aberration corrections in digital holographic microscopy. / Cromwijk, Tamar; Adhikary, Manashee; Konijnenberg, Sander et al.
Optical Measurement Systems for Industrial Inspection XIII. ed. / Peter Lehmann. Vol. 12618 SPIE, 2023. 126180Y (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 12618).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Non-isoplanatic lens aberration corrections in digital holographic microscopy

AU - Cromwijk, Tamar

AU - Adhikary, Manashee

AU - Konijnenberg, Sander

AU - Coene, Wim

AU - Tukker, Teus

AU - de Boer, Johannes

AU - Witte, Stefan

AU - den Boef, Arie

PY - 2023

Y1 - 2023

N2 - The demand for accurate and sub-nanometer precise overlay measurements in semiconductor industry increases with the shrinking feature sizes in integrated circuits. Overlay, the lateral displacement between two layers allows monitoring the chip fabrication process and is part of an import feedback step. In our approach, a digital holographic microscope measures the complex field of the overlay target using simple optics and an additional reference beam. The measured complex valued field allows us to apply computational algorithms to correct for field-position dependent lens aberrations in a computational efficient manner. We present experimental results that show the capability of our computational aberration correction in the visible and near infrared wavelength regimes.

AB - The demand for accurate and sub-nanometer precise overlay measurements in semiconductor industry increases with the shrinking feature sizes in integrated circuits. Overlay, the lateral displacement between two layers allows monitoring the chip fabrication process and is part of an import feedback step. In our approach, a digital holographic microscope measures the complex field of the overlay target using simple optics and an additional reference beam. The measured complex valued field allows us to apply computational algorithms to correct for field-position dependent lens aberrations in a computational efficient manner. We present experimental results that show the capability of our computational aberration correction in the visible and near infrared wavelength regimes.

KW - Semiconductor metrology

KW - computational imaging

KW - digital holographic microscopy

KW - lens aberrations correction

UR - http://www.scopus.com/inward/record.url?scp=85172710618&partnerID=8YFLogxK

U2 - https://doi.org/10.1117/12.2673637

DO - https://doi.org/10.1117/12.2673637

M3 - Conference contribution

VL - 12618

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optical Measurement Systems for Industrial Inspection XIII

A2 - Lehmann, Peter

PB - SPIE

T2 - Optical Measurement Systems for Industrial Inspection XIII 2023

Y2 - 26 June 2023 through 29 June 2023

ER -

Cromwijk T, Adhikary M, Konijnenberg S, Coene W, Tukker T, de Boer J et al. Non-isoplanatic lens aberration corrections in digital holographic microscopy. In Lehmann P, editor, Optical Measurement Systems for Industrial Inspection XIII. Vol. 12618. SPIE. 2023. 126180Y. (Proceedings of SPIE - The International Society for Optical Engineering). doi: https://doi.org/10.1117/12.2673637

Non-isoplanatic lens aberration corrections in digital holographic microscopy

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