Observation of an exponential FeSi spacer thickness dependence of the antiferromagnetic exchange coupling in Fe/Si-based multilayers

J. T. Kohlhepp, J. J. De Vries, F. J.A. Den Broeder, R. Coehoorn, R. M. Jungblut, A. Reinders, G. J. Strijkers, A. A. Smits, W. J.M. De Jonge

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Abstract

The magnetic interlayer exchange coupling in Fe/Si-based thin film structures employing sputtered multilayers with variations of Si-alloyed Fe for the magnetic layers and Fe-alloyed Si spacers, as well as wedge-shaped MBE-grown Fe/Si/Fe sandwich samples has been systematically studied. From structural and magnetic analysis it is concluded that ultrathin Si and FexSi100-x (x < 50) spacer layers transform into a crystalline iron silicide with a composition close to Fe50Si50. The exchange coupling mediated by this metallic silicide is antiferromagnetic and depends on the spacer thickness in an exponential, i.e. non-oscillatory, manner with a universal characteristic decay length of 3-4 angstrom at room temperature. This observation can be qualitatively explained within the framework of a recent coupling theory on the premise that the FeSi interlayer has the metastable CsCl(B2)-structure.

Original languageEnglish
Pages (from-to)593-604
Number of pages12
JournalMaterials Research Society Symposium - Proceedings
Volume475
DOIs
Publication statusPublished - 1997
EventProceedings of the 1997 MRS Spring Meeting - San Francisco, CA, USA
Duration: 31 Mar 19972 Apr 1997

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